第三屆國際先進光刻技術研討會

科技 06-21

第三屆國際先進光刻技術研討會

IWAPS 2019

10月17-18日, 南京, 金陵江濱酒店

Oct. 17-18, Nanjing, China

Nanjing Jinling Riverside Hotel

主辦單位：

承辦單位：

組委會：

CALL FOR PAPERS

2019.7.15：摘要提交截止

2019.7.31：摘要接受通知

2019.9.30：全文稿件截止

接收論文主題

SCOPE OF PAPERS

IWAPS致力於發表前沿的微電子製造技術研究成果。會議主題涵蓋先進半導體製造領域中從早期的理論和實驗，到工業化大規模量產的應用等內容。包括但不局限於:

光刻

極紫外光刻

新型技術

量測及缺陷檢測

設計工藝聯合優化(DTCO)與可製造性設計(DFM)

材料

器件

工藝

IWAPS is devoted to publishing research on the cutting-edge microelectronic manufacturing technology. The scope of the conference covers studies of advanced semiconductor manufacturing sciences and technologies from early stage theories and experiments to industrial high volume manufacturing applications. The perspective scope includes, but is not limited to the following areas:

Optical Lithography

Extreme Ultraviolet (EUV) Lithography

Advanced Patterning Technologies

Metrology, Inspection and Testing

Design and Technology Co-optimization and Design for Manufacturability

Materials

Device

Process

接收的會議稿件擇優將於《Journal of Microelectronic Manufacturing》上全文發表，並且給最佳論文作者頒發年度獎項。

Full length manuscripts of accepted papers will be considered for publication in the Journal of Microelectronic Manufacturing (JoMM).And IWAPS will present an annual award to the author of the paper judged to be the Best Paper.

摘要要求

ABSTRACT INSTRUCTIONS

摘要必須清楚地描述論文的性質、研究主題、研究內容、組織結構、要點以及研究意義。且用英文撰寫。

摘要必須包括以下內容：論文標題、關鍵詞、作者的姓名、所屬單位、郵件地址和通訊地址。摘要的字數不應超過500個單詞。對研究內容的細節的描述將增加稿件被接收的可能。同時，我們強烈建議在提交的摘要中使用圖表。

在截止日期之後提交的摘要將根據具體情況進行審議。

The abstract must clearly describe the nature, scope, content, organization, key points and significance of the proposed paper.

The ABSTRACT must include paper title, key words, author name, affiliation and full contact information (email and address). The Word of Abstract limit is up to 500 words. Introductory paragraph describing the intended content of your conference is a huge plus to your papers. Graphs are highly encouraged in the submitted abstract.

Abstracts submitted after the published deadline will be considered on a case-by-case basis.

報告要求

PRESENTATION INSTRUCTIONS

口頭報告（For oral presenters）：

海報展示（For poster presenters）：

被選作進行海報展示的作者，可於展示當日上午9點起張貼海報。展板上將印有按序排列的論文編號，請按論文編號將海報張貼在相應位置。會場將提供圖釘用于海報張貼。

Authors of papers selected for poster presentation may set up their posters from 9:00 am on the day of the poster session. Paper numbers will be posted on the poster boards in numerical order, please find your paper number and post your poster in the designated space. Poster supplies (push-pins) will be available.

關於JOMM

ABOUT JOMM

JoMM是由中國科學院微電子研究所創辦的國際化同行評議學術期刊，旨在發表集成電路製造領域中從實驗室理論階段到工業化大規模量產階段的研究成果。JoMM 現征2019 年各期稿件。JoMM追求高效的出版周期，文章一經接收將馬上上線，並免2019年版面費，歡迎投稿！

JoMM is an international peer-reviewed journal founded by the Institute of Microelectronics of Chinese Academy of Sciences (IMECAS). JoMM aims at reporting the progress on the cutting-edge advanced semiconductor manufacturing sciences and technologies from fundamental research to industrial high volume manufacturing applications. JoMM is inviting papers for 2019 issues. JoMM strives for shortened publication cycle, articles are published online as soon as accepted. And the publication charge is FREE for 2019.

關於IWAPS

ABOUT IWAPS

2017年IWAPS在北京